...superresolution lithography: overcoming chemical blur

来自 : www.zhangqiaokeyan.com/academi 发布时间：2021-03-24

【摘要】Photoinhibited superresolution (PInSR) lithography is a two-color, one-photon scheme that promises high throughput far-field patterning at deep subwavelength scales. Previous work has shown that the technique is susceptible to blurring from active species diffusion, an issue which we have recently overcome with the use of a low-diffusivity methacrylate resist. Here we present our first clear demonstration of superresolution, showing feature spacing 3x better than the 0.2 NA diffraction limit.

【摘要机译】

Previous work has shown that the technique is susceptible to blurring from active species diffusion, an issue which we have recently overcome with the use...Photoinhibited superresolution lithography: overcoming chemical blurPhotoinhibited superresolution (PInSR) lithography is a two-color, one-photon scheme that promises high throughput far-field patterning at deep subwavelength scales. Previous work has shown that thePhotoinhibited superresolution lithography: overcoming chemical blur